Innovation across the LAB14 Group
LAB14 unites specialized high-tech companies with complementary systems, software, materials, and services for demanding applications in microfabrication, nanofabrication, and surface analysis. From lithography and 3D microfabrication to process software, precision production technologies, and nanoscale analysis, the Group’s portfolio supports research-driven and industrial innovation. Intellectual property is a key part of how LAB14 protects the engineering expertise, application knowledge, and development work behind these technologies.
This page provides centralized information on patent markings across our subsidiaries. It is designed to inform competitors, customers, business partners, suppliers, licensees, research institutions, and other interested parties about the Group’s technologies and protected innovations.
Group IP Portfolio
We use virtual patent marking as an efficient way to communicate the patent protection of our products. Instead of listing patent numbers directly on the product, we provide a short notice, such as “Patented” or “Patent pending”.
The following list includes only the US‑issued patents of the LAB14 Group that apply to its products and technologies. This list will be updated periodically as new patents are granted. The patent numbers provided serve as public notice of the existing intellectual property rights.
US Patent Number | Title | Patent Owner |
|---|---|---|
| US10870243B2 | Method and device for producing microstructures on optical fibers | BADEN WURTTEMBERG STIFFUNG GMBH | NANOSCRIBE GMBH |
| US10401737B2 | Process dose and process bias determination for beam lithography | GenISys GmbH |
| US10409946B2 | Process artefact compensation upon transfer of a mask layout onto a mask substrate | GenISys GmbH |
| US7826130B2 | Device for the optical splitting and modulation of electromagnetic radiation | Heidelberg Instruments Mikrotechnik GmbH |
| US9176391B2 | Method and arrangement for displacement | Heidelberg Instruments Mikrotechnik GmbH |
| US10836105B2 | Device and method for creating three-dimensional structures | Heidelberg Instruments Mikrotechnik GmbH |
| US8390790B2 | Method and apparatus for reproducing a programmable mask on a substrate | Heidelberg Instruments Mikrotechnik GmbH |
| US9052608B2 | Method and device for imaging a radiation-sensitive substrate | Heidelberg Instruments Mikrotechnik GmbH |
| US9921486B2 | Multiscale patterning of a sample with apparatus having both thermo-optical lithography capability and thermal scanning probe lithography capability | Heidelberg Instruments Nano AG |
| US10209630B2 | Scanning probe nanolithography system and method | Heidelberg Instruments Nano AG |
| US9977050 | WEAR-LESS OPERATION OF A MATERIAL SURFACE WITH A SCANNING PROBE MICROSCOPE | Heidelberg Instruments Nano AG |
| US8023393 | METHOD AND APPARATUS FOR REDUCING TIP-WEAR OF A PROBE | Heidelberg Instruments Nano AG |
| US8986563B2 | Method for the production of three-dimensional microstructures | Nanoscribe Holding GmbH |
| US9798248B2 | Method for producing a structure | Nanoscribe Holding GmbH |
| US9302430B2 | Method and device for a spatially resolved introduction of an intensity pattern comprising electro-magnetic radiation into a photosensitive substance as well as applications thereof | Nanoscribe Holding GmbH |
| US9937664B2 | Method for producing a three-dimensional structure | Nanoscribe Holding GmbH |
| US10118376B2 | Process for producing a three-dimensional structure | Nanoscribe Holding GmbH |
| US11179883B2 | Method for producing a 3D structure by means of laser lithography, and corresponding computer program product | Nanoscribe Holding GmbH |
| US10310385 | OPTICAL SYSTEM FOR PRODUCING LITHOGRAPHIC STRUCTURES | Nanoscribe Holding GmbH |
| US9989862 | OPTICAL SYSTEM FOR PRODUCING LITHOGRAPHIC STRUCTURES | Nanoscribe Holding GmbH |
| US11499990B2 | Atomic force microscope probes and methods of manufacturing probes | Nanosurf AG |
| US12571711B2 | Apparatus and method for determining mechanical properties of a system | Nanosurf AG |
| US10564181B2 | Atomic force microscope with optical guiding mechanism | Nanosurf AG |
| US10981394B2 | Method for printing a varying pattern of landing zones on a substrate by means of ink-jet printing | Notion Systems GmbH |
| US12414242B2 | Method for ink jet printing of a substrate | Notion Systems GmbH |
| US12479227B2 | Method and device for printing on a substrate by way of inkjet printing | Notion Systems GmbH |
| US11328918B2 | Device and method for electron transfer from a sample to an energy analyzer and electron spectrometer device | SPECS Surface Nano Analysis GmbH |
| US9453893B2 | Spin detector arrangement for measuring the vector component of a spin vector predominating in a particle beam | SPECS Surface Nano Analysis GmbH |
| US7773009 | HIGH RESOLUTION DIGITAL ANALOG CONVERSION CIRCUIT | SPECS Surface Nano Analysis GmbH |
